Featured Microscopist: Spike (M.I.) Walker

Silicon Wafer

Etched silicon wafer

The underside of a silicon wafer, utilized in the manufacture of integrated circuits, was etched and photographed with reflected light. The objective was an epiplanachromat 16x/0.35 NA (polarized light) utilizing a vertical illuminator (epicondenser) and differential interference contrast (DIC) illumination. The microscope was a Zeiss Ultraphot III with a automatic 35-millimeter photohead. The film was Fujichrome Velvia. (63x)

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