Featured Microscopist: Spike (M.I.) Walker

Silicon Wafer

Etched silicon wafer

The underside of a silicon wafer, utilized in the manufacture of integrated circuits, was etched and photographed with reflected light. The objective was an epiplanachromat 16x/0.35 NA (polarized light) utilizing a vertical illuminator (epicondenser) and differential interference contrast (DIC) illumination. The microscope was a Zeiss Ultraphot III with a automatic 35-millimeter photohead. The film was Fujichrome Velvia. (63x)


Text and graphics for this article are
© 2000-2013 by Spike (M. I.) Walker.
All Rights Reserved under copyright law.
© 1995-2013 by Michael W. Davidson and The Florida State University. All Rights Reserved. No images, graphics, software, scripts, or applets may be reproduced or used in any manner without permission from the copyright holders. Use of this website means you agree to all of the Legal Terms and Conditions set forth by the owners.
This website is maintained by our
Graphics & Web Programming Team
in collaboration with Optical Microscopy at the
National High Magnetic Field Laboratory.
Last modification: Monday, Dec 01, 2003 at 12:54 PM
Access Count Since November 18, 2000: 6365